SPIE Photomask Technology is the premier worldwide technical meeting for mask making, emerging mask technologies, and mask business. This 3 days conference and exhibition is being organized by International Society For Optical Engineering (SPIE). The venue of this event is San Jose McEnery Convention Center which is situated in San Jose, California, United States of America. The event will be held from 12 September 2016, Monday to 14 September 2016, Wednesday. SPIE Photomask Technology will showcase a wide range of products and services related to optics sector from the leading exhibitors, for example, mask data preparation, substrates and materials, patterning tools and processes, resist and resist processing, etch techniques, metrology, inspection, repair, cleaning, contamination, and haze, simulation of mask making, lithograph, opc, and smo models, magnification interactions, impact of half-field reticles, stitching for mask making/design, EUV mask making, EUV mask inspection and repair, EUV mask infrastructure, EUV mask application, nanoimprint mask making, nanoimprint mask application, pixelated masks, alternative mask technologies, grey-scale masks, direct-write, mask manufacturing control, mask shop management, mask management in wafer fabs, business aspects of masks, infrastructure challenges.